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  • For purposes of illustration, metal lines12 will be considered to be comprised of aluminum-copper alloy (Al--Cu) with a barrier layer.Although a line structure is formed, the present invention is not so limited and other structures may be formed and used with the present invention.As shown in FIG. 2, silicon-rich carbide (SRC) layer 14 is formed over Al--Cu lines 12 and semiconductor structure 10
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