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  • ormula: >N--R4 in which R4 is a hydrogen atom or an alkyl group; R1, R2 and R3 are the same or different...http://www.google.com/patents/US5198323?utm_source=gb-gplus-sharePatent US5198323 - Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation componentAdvanced Patent SearchPublication numberUS5198323 APublication typeGrantApplication numberUS 07/694,3
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