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  • Most preferred comonomers are tetrafluoroethylene and chlorotrifluoroethylene. [0065] In some preferred embodiments, the fluorine-containing copolymer of the photoresists of this invention further comprises a repeat unit derived from at least one unsaturated compound selected from the group of structures H???N: [0066] wherein: [0067] each of m and n is 0, 1 or 2, p is an integer of at least 3; [00
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