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  • ows a schematic view of the apparatus of the present invention.DESCRIPTIONOF THE PREFERRED EMBODIMENTThe apparatus of the present invention is broadly denoted by the numeral 20 and includes a hollow housing 22 defines a process chamber 1 having an inlet 2 for directing reactants, such as oxygen, silane, other compounds transported in the vaporphase, or their mixtures as required by the CVD process
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