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  • 1Novellus Systems, Inc.Apparatus and method for controlling plasma uniformity across a substrateUS6179983Nov 13, 1997Jan 30, 2001Novellus Systems, Inc.Method and apparatus for treating surface including virtual anodeUS6193854Aug 16, 1999Feb 27, 2001Novellus Systems, Inc.Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter sourceUS6217716May 6, 1998Apr 17, 2001No
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