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  • A purge ring 222 may be disposed on the substrate support 212 to define a purge channel 224 that provides a purge gas to prevent deposition on a peripheral portion of the substrate 210. [0047] A gas delivery apparatus 230 is located at an upper portion of the chamber body 202 to provide a gas, such as a process gas and/or a purge gas, to the chamber 200.
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