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An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

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  • Its CMP slurries are used for various polishing applications, including materials that conduct electrical signals, such as tungsten, copper, tantalum, and aluminum; the dielectric insulating materials that separate conductive layers within logic and memory IC devices; and certain materials that are used in the production of rigid disks and magnetic heads for hard disk drives.
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