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  • 0:50 to 99.99:0.01 (weight ratio) if an insulating film pattern of negative type is to be formed.As for the organic solvent useful in this case, a hydrocarbon solvent, particularly an aromatic hydrocarbon solvent such as toluene and xylene can be employed.This photosensitive composition (c) may contain, as a silicone polymer, a copolymer consisting of a monomer represented by the general formula (
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