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  • the trench or recess and in electrical contact with the sacrificial layer, (4) depositing a conducting layer, e.g. a metal layer such as copper or tungsten, and overfilling the trench or recess, and (5) removal and/or planarising of the conducting metal layer to make a damascene structure, the materials of the sacrificial layer and the barrier layer being chosen so that during planarising the sacr
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