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  • According to the invention, it is possible to make unnecessary, or reduce, the conventional introduction of an inert gas such as N2 to a vacuum pump, by recovering gas comprising perfluorocompounds (PFCs), such as CF4, CHF3, C2F6, HF3, and SF6, contained in gas emitted from a semiconductor device manufacturing apparatus, and using the recovered gas as an inert gas for the vacuum pump.
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