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  • y, Inc.System and device including a barrier layerUS6821838Oct 18, 2002Nov 23, 2004Micron Technology, Inc.Method of forming an ultra thin dielectric film and a semiconductor device incorporating the sameUS6995502Feb 4, 2002Feb 7, 2006Innosys, Inc.Solid state vacuum devices and method for making the sameUS6998356Nov 12, 2003Feb 14, 2006Micron Technology, Inc.Method of fabricating a semiconductor de
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