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  • FIG. 5B is a diagram showing the top view of the epitaxial structure shown in FIG. 5A after the trench etching process according to the present invention is performed, wherein the relative intensity of the optical output is increased from original 24.5 to 25.5 (4.1% increase) under the condition that the current is 20 mA and the forward voltage Vf is 3.5V.
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