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  • Specifically, after surfaces of the base substrate 100 and the substrate 140 are cleaned by a method such as ultrasonic cleaning (with a frequency of 50 kHz to 5 MHz, so called megasonic cleaning) and subjected to treatment using a chemical solution which provides hydrophilic groups (such as ozone water, a mixture of ammonium water and a hydrogen peroxide solution (and water), or another oxidizing
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