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  • 5751031 *Apr 28, 1997May 12, 1998Micron Technology, Inc.Memory and other integrated circuitry having a conductive interconnect line pitch of less than 0.6 micronUS5768146 *Mar 28, 1995Jun 16, 1998Intel CorporationMethod of cell contouring to increase device densityUS5798541 *Mar 17, 1997Aug 25, 1998Intel CorporationStandard semiconductor cell with contoured cell boundary to increase device density
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