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An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

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  • A pattern formation method comprising the steps of: forming a resist film including a chemically amplified resist material, said chemically amplified resist material having a polymer whose solubility in a developer is changed in the presenceof an acid; an acid generator that generates an acid through irradiation with exposing light; and a base generator that generates a base through irradiation wi
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