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  • Moreover, when forming source/drain electrodes 7, 9 (see FIG. 18C), a storage electrode 43 is formed by, for example, sputtering and patterning a metal such as Al, Mo, Cr, Ta, Ti or Al alloy which overlaps a part of gate bus line 1 (and/or side electrode 15) and pixel electrode 13 (see FIG. 11B).
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