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An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

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  • The post apply bake process chamber may be configured to heat the resist-coated specimen at a temperature of approximately 90??? C. to approximately 140??? C. The post apply bake process may be used to drive solvent out of the resist and to alter a property of the resist such as surface tension.
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