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  • A purge ring 22 may be disposed on the substrate support 12 to define a purge channel 24 which provides a purge gas to prevent deposition on a peripheral portion of the substrate 10. [0017] A gas delivery apparatus 30 is disposed at an upper portion of the chamber body 2 to provide a gas, such as a process gas and/or a purge gas, to the chamber 1.
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