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  • The insulative or dielectric layer 14 may be formed in situ by known techniques (e.g., silicon dioxide) or by applying other insulative materials (e.g., polymeric insulating materials including polyimides and Parylene??? polymers, silicon nitride, silicon oxynitride, and glasses such as borosilicate glass (BSG), phosphosilicate glass (PSG), and borophosphosilicate glass (BPSG)).
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