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  • Micron Technology, Inc.System for real-time control of semiconductor wafer polishing including heater* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS6150271 *Sep 10, 1998Nov 21, 2000Lucent Technologies Inc.Differential temperature control in chemical mechanical polishing processesUS6432825 *Nov 23, 1999Aug 13, 2002Nec CorporationSemiconductor device producti
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