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  • ials, Inc.Method for removing redeposited veils from etched platinumUS6093332 *Feb 4, 1998Jul 25, 2000Lam Research CorporationFlowing etchant source gas into plasma processing chamber, gas including fluorocarbon and nonreactive gases, providing radio frequency power wave form to electrode associated with plasma processing chamber, forming plasma, depositing polymerUS6127277 *Nov 1, 1996Oct 3, 2000
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