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  • In particular, PH3 and PF3 are suitable. [0064] Furthermore, it may be performed to adequately dilute the above-described compound, which can be gasified, with a gas such as H2, He, Ne, Ar, Xe, or Kr and introduce the mixture into a film formation chamber. [0065] Moreover, it is possible to use various kinds of deposited-film formation apparatuses when a deposited-film formation method herein is e
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