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  • In another aspect, the substrate in a cleaning process is terminated by an intermediate reactive molecular fragment selected from a group including OH, NH, NH2, SH, SeH, AsH, and AsH2. [0157] A CRISP method in a surface preparation of process is also utilized for initiating ALD growth by introducing a metal ALD precursor into the reaction chamber, in which the metal ALD precursor reacts with the s
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