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  • In the method of manufacturing the thin-film magnetic head of this example, as shown in FIG. 12A and FIG. 12B, an insulating layer 2 made of an insulating material such as alumina (Al2O3) or silicon dioxide (SiO2) whose thickness is 1 to 20 ??m, for example, is deposited through a method such as sputtering on a substrate 1 made of a ceramic material such as aluminum oxide and titanium carbide (Al2
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