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  • n the defect inspecting apparatus shown in FIG. 3; FIG. 5 is an explanatory diagram used for describing a method provided by the present invention to radiate a slit-shaped beam to a substrate being inspected such as a semiconductor wafer and a method provided by the present invention to detect a beam reflected by the substrate; FIG. 6 is a diagram showing a squint view of a light beam radiated by
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