In vapor evaporation, a gas such as O2 or H2 may optionally be introduced to perform reactive vapor evaporation. [0056] Sputter deposition is conducted in such a manner that after setting a support in a sputtering apparatus, the inside of the apparatus is evacuated to a vacuum level of 1.333???10???4 Pa and then inert gas used for sputtering such as Ar and Ne is introduced therein at a gas pressur