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  • In addition, in order to eliminate shrink, it is desirable to carry out vacuum heating right before deposition of a film which includes an organic compound, and it is transferred to the pretreatment chamber 503 b, and in order to completely remove moisture and other gas which are included in the above-described substrate, anneal for deairing is carried out in vacuum (5???10???3 Torr (0.665 Pa) or
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