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  • ng said resist film after the pattern exposure wherein said based polymer is an ??-methylstyrene derivative: General Formula 9: General Formula 10: wherein R0 is an alkyl group; R1 is a group that is decomposed through irradiation of light; and R3 and R4 are the same or different and selected from the group consisting of hydrogen and compounds including hydrogen and carbon; at least one of R5 and
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