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  • Minsk et al U.S. Pat. Nos. 2,610,120; 2,690,966; 2,670,285; 2,670,286; and 2,670,287 respectively disclose light-sensitive photomechanical resist compositions containing polymeric materials containing combined polymeric units having R -- CH ??? CH -- CO groups wherein R is an aryl group such as a phenyl, m-nitrophenyl, etc. sensitized with nitro, triphenylmethane, anthrone, quinone and ketone comp
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