if an insulating film pattern of positive type is to be formed, and in the range of 50:50 to99.99:0.01 (weight ratio) if an insulating film pattern of negative type is to be formed.As for the organic solvent useful in this case, a hydrocarbon solvent, particularly an aromatic hydrocarbon solvent such as toluene and xylene can be employed.This photosensitive composition (b) may contain, as a silic