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  • r formed using a reactive agentUS7074708Feb 27, 2004Jul 11, 2006Applied Materials, Inc.Method of decreasing the k value in sioc layer deposited by chemical vapor depositionUS7095088Jun 3, 2004Aug 22, 2006Micron Technology, Inc.System and device including a barrier layerUS7153580Aug 8, 2003Dec 26, 2006Aviza Technology, Inc.Low ?? dielectric inorganic/organic hybrid films and method of makingUS72450
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