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  • Thus, a contact hole is formed in the second insulating film 104, the third insulating film 106, and the fourth insulating film 107. [0035] As shown in FIG. 3(A), a first electrode 111 connected to a TFT, a wiring 112 (power source line), and a wiring 113 (data signal line) are formed so as to contain at least one of metal materials including Al, W, Ta, Ti, Mo, etc.
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