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  • at will not work HNA (Hydrofluoric acid+Nitric acid+Acetic acid), or any other suitable silicon etchant (when the substrate or layer to be removed in the release is silicon (amorphous silicon or polysilicon or single crystal silicon???or tungsten, tungsten nitride, molybdenum, titanium or other material that can be removed in a silicon etchant such as XeF2).
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