prov:value
| - TECHNICAL FIELD This invention relates generally to an exposure apparatus that utilizes an immersion method, and is suitable, for example, for the lithography process for manufacturing highly integrated devices, such as semiconductor devices, e.g., ICs and LSIs, image pick-up devices, e.g., CCDs, display devices, e.g., a liquid crystal panels, communication devices, e.g., optical waveguides, and m
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