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  • This exposure apparatus is used when manufacturing a semiconductor device such as an IC or LSI circuit, a liquid crystal device, an imaging device such as a CCD and a device such as a magnetic head. [0036] As shown in FIG. 1, the exposure apparatus includes a KrF excimer laser 11 having comparatively little spatial coherence; an incoherent optical system 20, which is for splitting light flux, havi
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