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  • The remaining portion 310 of the top electrode preferably also includes a more conductive material, such as an elemental metal, deposited thereover. [0154] In another example, the initial thin conductive film 308 comprises a thin (e.g., between about 10 nm and 30 nn) elemental metal layer, exemplified by the W formed by the process of Table VIII. In this case, the remainder 310 of the top electrod
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