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  • The sheet resistance of the insulating film immediately below the resist film is preferably at least 1???1012 /???, and includes, for example, silicon oxide, silicon nitride, silicon oxynitride, spin-on glass, a silicon-based insulating film such as a blank material used in the manufacture of a mask, and resins such as quinone diazide-novolak resin, polystyrene, polysulfone, polyamide, polyimide,
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