prov:value
| - The material of the insulating film 13 preferably exhibits a sheet resistance of at least 1???1012 ??/???, and includes, for example, silicon oxide, silicon nitride, silicon oxynitride, spin-on glass, a silicon-based insulating film such as a blank material used in the manufacture of a mask, and resins such as quinone diazide-novolak resin, polystyrene, polysulfone, polyamide, polyimide, polymethy
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