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  • The top plate 3 is constituted by a material of silicon system and forms patterns of the liquid flow path 7 and the common liquid chamber 8 by etching or, after materials such as silicon nitride, silicon oxide or the like which become the flow path side wall 9 are deposited on a silicon substrate by the known film forming method such as CVD or the like, forms a portion of the liquid flow path 7 by
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