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  • The deposition chamber 40 includes external devices including rotary pump 51 for evacuating the chamber 40 to a low pressure, a cryo-pump 52 and an ambient gas source such as gas bottles for supplying an ambient gas, so as to maintain the atmosphere inside the chamber 45 to be in a low pressure gaseous environment, containing an inert atmosphere comprised by argon gas or other inert gas or by an i
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