About: isa:307821398   Sponge Permalink

An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

AttributesValues
rdf:type
prov:value
  • Then, there is formed a resist pattern 5 for forming a throughhole 7 at a desired portion of the semiconductor device on the way of its manufacturing process, by means of photoengraving process, as shown in FIG. 2C. Further, an isotropic etching is performed to the second plasma oxide film 4 by means of such chemicals as dilute hydrofluoric acid etc. so that a taper portion 6 for reducing the aspe
prov:wasQuotedFrom
is prov:wasDerivedFrom of
Alternative Linked Data Views: ODE     Raw Data in: CXML | CSV | RDF ( N-Triples N3/Turtle JSON XML ) | OData ( Atom JSON ) | Microdata ( JSON HTML) | JSON-LD    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3217, on Linux (x86_64-pc-linux-gnu), Standard Edition
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2012 OpenLink Software