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  • The insulating layers 145 a, 145 b, 145 c, 145 d, 145 e, and 145 f can be formed in such a way that an insulating layer is formed by a single layer or a stacked structure using an inorganic material that contains nitrogen or oxygen, such as silicon oxide, silicon nitride, silicon oxynitride, or silicon nitride oxide, or an organic material such as an organic resin by a CVD method or a sputtering m
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