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  • Further, both CVD and RTCVD are flux-dependent processes requiring uniform substrate temperatures and uniform distribution of the chemical species in the process chamber. [0004] Promising candidates for materials for capacitor electrodes in IC memory structures include noble metals, such as platinum (Pt), palladium (Pd), iridium (Ir), ruthenium (Ru), rhodium (Rh) and osmium (Os), as wells as their
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