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  • Suitable materials for forming the patterning portions 142, 152 include, but are not limited to, transparent or semi-transparent oxides and nitrides, such as silicon dioxide, silicon nitride, tetraethylorthosilicate (TEOS) based oxides, borophosphosilicate-glass (BPSG), phosphosilicate-glass (PSG), borosilicateglass (BSG), oxide-nitride-oxide (ONO), plasma enhanced silicon nitride, spin-on glass (
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