effects, and device-manufacturing methods comprising sameUS656356816 Jul 200213 May 2003Micron Technology, Inc.Multiple image reticle for forming layersUS664672216 Jul 200211 Nov 2003Micron Technology, Inc.Improvement in dimensions of circuitry and other structures formed on the semiconductor wafer; optical lithographic techniques used in the formation of integrated circuitsUS76232504 Feb 200524 N