prov:value
| - g 3, 2004Micron Technology, Inc.Method of forming a dielectric layerUS6774443Jan 3, 2002Aug 10, 2004Micron Technology, Inc.System and device including a barrier layerUS6821838Oct 18, 2002Nov 23, 2004Micron Technology, Inc.Method of forming an ultra thin dielectric film and a semiconductor device incorporating the sameUS6998356Nov 12, 2003Feb 14, 2006Micron Technology, Inc.Method of fabricating a s
|