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  • method thereofUS7910421May 30, 2008Mar 22, 2011Samsung Electronics Co., Ltd.Methods of forming devices including different gate insulating layers on PMOS/NMOS regionsUS7964460Apr 25, 2008Jun 21, 2011Infineon Technologies AgMethod of manufacturing an NMOS device and a PMOS deviceUS7973369May 14, 2010Jul 5, 2011Infineon Technologies AgSemiconductor devices and methods of manufacture thereofUS798928
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