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  • If the FFS insulating layer is made of an inorganic insulating material, such as silicon nitride, silicon oxide, or silicon oxynitride, however, a gas containing hydrogen, such as monosilane (SiH4), may be used as the material gas, or a hydrogen-containing gas such as ammonia (NH3) is often contained in the carrier gas for reaction even if monosilane is not used.
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