prov:value
| - As noted above, the gate may be comprised of any material (for example, a metal such as palladium (Pd), platinum (Pt), gold (Au), molybdenum nitride (MoN), tungsten nitride (WN), titanium nitride (TiN), iridium (Ir), iridium oxide (IrO2), ruthenium (Ru), ruthenium oxide (RuO2) having a work function greater than n+ polycrystalline silicon (for example, a work function that is greater than 4 eV).
|