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  • In embodiments where the substance to be removed is a metal or conductive material such as W, WN, WSi, Ta, TaN, Ti, TiSi, ITO (Indium Tin Oxide), Cu, Al, and combinations thereof, the gas mixture may contain one or more reactive gases selected from a halogen-containing gas, such as F2, NF3, XeF2, CF4, C2F6, C3F8, C4F8, COF2, Cl2, Br2, HBr, HI, HF, ClF3, ClF, BrF3, Cl2, and HCl.
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